Optical Procximity Correction (OPC) Software Market Summary
Optical Proximity Correction (OPC) is the most important part of computational lithography. It is used in photolithography mask optimization. It is a necessary software to ensure that the final image of the silicon wafer is not distorted. It is also the most important link in determining product yield. Inverse Lithography Technology (ILT), also called reverse lithography technology and reverse lithography technology, is a new generation of computational lithography technology. It targets the pattern to be realized on the silicon wafer and inversely calculates it. Algorithm for the required graphics on the mask. At present, Chinese company Dongfang Jingyuan has adopted GPU accelerated computing and full-chip ILT technology for mask optimization solutions. It uses deep learning and big data to accurately model the photolithography process, optimize the process window, and ensure yield.
- Global Optical Procximity Correction (OPC) Software MarketSize(US$ Million), 2018-2029
Source: QYResearch, “Optical Procximity Correction (OPC) Software – Global Market Insights and Sales Trends 2024”
According to the new market research report “Optical Procximity Correction (OPC) Software – Global Market Insights and Sales Trends 2024”, published by QYResearch, the global Optical Procximity Correction (OPC) Software market size is projected to reach USD 0.78 billion by 2029, at a CAGR of 14.1% during the forecast period.
- Global Optical Procximity Correction (OPC) Software TopFivePlayers Ranking and Market Share (Ranking is based on the revenue of 2022, continually updated)
Source: QYResearch, “Optical Procximity Correction (OPC) Software – Global Market Insights and Sales Trends 2024”
According to QYResearch Top Players Research Center, the global key manufacturers of Optical Procximity Correction (OPC) Software include Brion (ASML), KLA, Mentor (Simens), Synopsys, Samsung, Anchor Semiconductor, GenISys GMBH, Yuwei Optical Software, Moyan Computational Science, GWX Technology, etc.
In 2022, the global top five players had a share approximately 82.3% in terms of revenue. The market is highly concentrated. At present, the global core manufacturers are mainly located in Europe.
With the development of large-scale integrated circuit technology, the requirements for photolithography resolution are becoming higher and higher. Resolution enhancement technology has become increasingly important. In the development process of resolution enhancement technology, the importance of computational lithography software such as OPC is becoming more and more prominent. Before lithography manufacturing of chips below 90nm or even 180nm, OPC software must be used for optimization. Without OPC, all IC manufacturers will lose the ability to convert chip designs into chip products. The combination of phase shift mask technology and optical proximity effect correction technology can improve the photolithography accuracy of the 193 nm wavelength Ar F excimer laser source. To the 40 nm process node, coupled with the application of immersion lens exposure technology and double exposure technology, it can be further improved to the 22 nm process node, and may even be applied at the 16 nm process node.
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