Sputtering targets are typically solid slabs of various sizes and shapes. The target materials can be pure metals, alloys or compounds such as oxides or nitrides.
This report only covers Pure Metal Sputtering Target Materials. Pure Metal sputtering targets are usually made from highly pure metals. They are the most widely used and fundamental coating materials for other sputter deposition technology. Such sputtering targets as aluminum, copper, silver, and gold are quite common in the modern industry.
According to the new market research report “Pure Metal Sputtering Target Materials – Global Market Insights and Sales Trends 2024”, published by QYResearch, the global Pure Metal Sputtering Target Materials market size is projected to reach USD 2.35 billion by 2029, at a CAGR of 1.9% during the forecast period.
- Global Pure Metal Sputtering Target Materials MarketSize(US$ Million), 2018-2029
Source: QYResearch, “Pure Metal Sputtering Target Materials – Global Market Insights and Sales Trends 2024”
- Global Pure Metal Sputtering Target Materials Top14Players Ranking and Market Share (Ranking is based on the revenue of 2022, continually updated)
Source: QYResearch, “Pure Metal Sputtering Target Materials – Global Market Insights and Sales Trends 2024”
The global key manufacturers of Pure Metal Sputtering Target Materials include JX Nippon, Honeywell Electronic Materials, KFMI, Plansee, Tosoh, Materion, Sumitomo Chemical, Hitachi Metals, ULVAL, GRIKIN, etc. In 2021, the global top 10 players had a share approximately 70.0% in terms of revenue.
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