CMP Membrane is a key part attached on the back of semiconductor wafer inside CMP (Chemical mechanical polishing) device to absorb semiconductor wafer in the semiconductor wafer polishing process. As membrane contacts semiconductor wafer directly, it has no surface scratch, foreign substance, bubble and other defect at all. For its direct relationship with polishing, membrane thickness should be maintained constantly within ±0.1mm difference.
Membrane types are differentiated according to each CMP equipment head and produced in two different sizes of 200mmm and 300mmm. The 300mm size is used mostly in line with semiconductor development towards high-integration and yield enhancement. The 200mm size is produced with two materials of EPDM and silicon. The 300mm is made of the silicon material.
This report studies the 300mm Membranes.
According to the new market research report “Global CMP Membranes (300mm Membranes) Market Insights, Forecast to 2028”, published by QYResearch, the global CMP Membranes (300mm Membranes) market size is projected to reach USD 0.22 billion by 2029, at a CAGR of 5.6% during the forecast period.
- Global CMP Membranes (300mm Membranes) MarketSize(US$ Million), 2018-2029
Source: QYResearch, "Global CMP Membranes (300mm Membranes) Market Insights, Forecast to 2028”
- Global CMP Membranes (300mm Membranes) Top9 Players Rankingand Market Share (Ranking is based on the revenue of 2022, continually updated)
Source: QYResearch, "Global CMP Membranes (300mm Membranes) Market Insights, Forecast to 2028”
The global key manufacturers of CMP Membranes (300mm Membranes) include Applied Materials, Inc. (AMAT), EBARA, MOS, Materials Nano Engineering (MNE), Warde Tec, etc.
In 2022, the global top four players had a share approximately 87.0% in terms of revenue.
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