A hardmask is a material used in semiconductor processing as an etch mask instead of a polymer or other organic "soft" resist material.
According to the new market research report "Hard Mask Material - Global Market Share and Ranking, Overall Sales and Demand Forecast 2024-2030", published by QYResearch, the global Hard Mask Material market size is projected to grow from USD 1.32 billion in 2023 to USD 3.03 billion by 2029, at a CAGR of 14.8% during the forecast period.
- Global Hard Mask Material MarketSize(US$ Million), 2018-2029
Source: QYResearch, "Hard Mask Material - Global Market Share and Ranking, Overall Sales and Demand Forecast 2024-2030”
- Global Hard Mask Material Top7Players Ranking and Market Share (Ranking is based on the revenue of 2022, continually updated)
Source: QYResearch, "Hard Mask Material - Global Market Share and Ranking, Overall Sales and Demand Forecast 2024-2030”
This report profiles key players of Hard Mask Material such as Samsung SDI, JSR, Merck Group, Nissan Chemical Industries, Shin-Etsu MicroSi.
In 2022, the global top five Hard Mask Material players account for 84.6% of market share in terms of revenue. Above figure shows the key players ranked by revenue in Hard Mask Material.
In terms of product application, Spin Coating Process is the largest application, hold a share of 60.15%.
Market Drivers:
Development of nanotechnology: With the continuous development of nanotechnology, the demand for high-precision and high-resolution mask materials increases. Hard mask materials have the characteristics of high hardness, high wear resistance, and high corrosion resistance, and can meet the special requirements for high-precision masks in the field of nanotechnology.
Integrated circuit manufacturing needs: During the integrated circuit manufacturing process, mask materials are required to transfer circuit patterns from the source mask to the target substrate. Hard mask materials have the characteristics of high transmittance, high resolution, and low defect rate, and can meet the demand for high-quality masks in the field of integrated circuit manufacturing.
Optical device manufacturing needs: During the optical device manufacturing process, mask materials are required to transfer optical patterns from the source mask to the target substrate. Hard mask materials have the characteristics of high transmittance, high resolution, and low reflectivity, and can meet the demand for high-quality masks in the field of optical device manufacturing.
Restraint:
High production costs: Hard mask materials usually require the use of high-purity, high-cost raw materials, and require complex processing and preparation processes, so their production costs are high, which limits the wide application of hard mask materials to a certain extent.
Difficulty in processing: The hard mask material has high hardness and is difficult to process. It requires the use of high-precision and high-efficiency processing equipment and technology, which increases the cost and difficulty of processing.
Insufficient performance stability: The performance stability of the hard mask material is insufficient and is easily affected by factors such as temperature, humidity, ultraviolet rays, etc., thus affecting the accuracy and life of the mask.
Opportunity:
Rapid development of 5G and IoT technologies: The rapid development of 5G and IoT technologies will drive the growth of the semiconductor industry, thereby increasing the demand for hard mask materials. Hard mask materials play an important role in semiconductor manufacturing, and with the widespread application of 5G and IoT technologies, the demand for hard mask materials will further increase.
Upgrading of consumer electronics products: The upgrading of consumer electronics products will provide new market demand for hard mask materials. With the continuous upgrading of consumer electronics such as smartphones and tablets, the demand for high-precision and high-quality hard mask materials will continue to increase.
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