Photo Acid Generator (PAG) is a kind of compound that can be decomposed to generate specific acid under the irradiation of light, rays, plasma, etc. The generated acid can decompose or cross-link the acid-sensitive resin, thereby Increase the dissolving contrast between the illuminated part and the non-illuminated part. Since photoacid generators (PAGs) form controllable acids under external stimuli, they can be used in the field of photoresists (ie, resists). The downstream of photoacid generator (PAG) is semiconductor photoresist, and the terminal is in many fields of national economy and national defense construction such as consumer electronics, household appliances, information communication, automotive electronics, aerospace, military industry, etc.
According to the new market research report “Photo Acid Generator (PAG) - Global Market Share and Ranking, Overall Sales and Demand Forecast 2024-2030”, published by QYResearch, the global Photo Acid Generator (PAG) market size is projected to reach USD 0.62 billion by 2029, at a CAGR of 20.7% during the forecast period.
- Global Photo Acid Generator (PAG) MarketSize(US$ Million), 2018-2029
Source: QYResearch, "Photo Acid Generator (PAG) - Global Market Share and Ranking, Overall Sales and Demand Forecast 2024-2030”
- Global Photo Acid Generator (PAG) Top7Players Ranking and Market Share (Ranking is based on the revenue of 2022, continually updated)
Source: QYResearch, "Photo Acid Generator (PAG) - Global Market Share and Ranking, Overall Sales and Demand Forecast 2024-2030”
The global key manufacturers of Photo Acid Generator (PAG) include Toyo Gosei, FUJIFILM Wako Pure Chemical, San Apro, Heraeus, Nippon Carbide Industries, etc. In 2021, the global top four players had a share approximately 89.0% in terms of revenue.
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